GelEtch Delayering System
The GelEtch delayering system is a complete cosmetic overhaul of the world-famous OmniEtch delayering system introduced a few years ago. Retaining the same operational principles as its predecessor, the GelEtch features a 40% reduced footprint, nearly 60% reduction in weight, and a much simpler — and more intuitive — user interface.

As its predessor, the GelEtch die delayering system's unique, proprietary method of wet chemical delivery to an integrated circuit (either individual die or wafer-level), the GelEtch is capable of delayering a die — one selective level at a time! The benefit that the GelEtch has over previous methods — such as lapping — are numerous; the primary being that the etching is layer-specific. Due to its uniquely engineered medium, the die's vias remain intact during the etch, with underlying layers remaining completely unaffected.
OmniEtch Delayering System (Replaced with GelEtch, above)
As the need for more sophisticated failure analysis grows, so, too, must the instrumentation with which the industry's most complex integrated circuits are analyzed. In collaboration with Texas Instruments, NTG has developed the latest in delayering technology, the OmniEtch.

With its unique, proprietary method of wet chemical delivery to an integrated circuit (either individual die or wafer-level), the OmniEtch is capable of delayering a die — one selective level at a time! The benefit that the OmniEtch has over previous methods — such as lapping — are numerous; the primary being that the etching is layer-specific. Due to its uniquely engineered medium, the die's vias remain intact during the etch, with underlying layers remaining completely unaffected.
Click the image above or here for product specifications on the OmniEtch.